Professor L.-S. Fan elected Foreign Fellow of Indian National Academy of Engineering

Posted: September 30, 2019

Professor L.-S. Fan has been elected a Foreign Fellow of the Indian National Academy of Engineering (INAE), the country's most distinguished body of engineers, engineer-scientists and technologists.

Fan, who carries the titles Distinguished University Professor, C. John Easton Professor in Engineering, and Professor of Chemical and Biomolecular Engineering, is already a member of the United States' National Academy of Engineering (NAE). In addition, he is a Foreign Member of the Chinese Academy of Engineering, the Australia Academy of Technology Science and Engineering, the Mexican Academy of Sciences, and Academia Sinica as Academician, which is the highest form of academic recognition in the Republic of China in Taiwan.

The Indian National Academy of Engineering comprises engineers from the entire spectrum of engineering disciplines, and has the main objective of promoting engineering and technologies and their applications in pursuit of the right solutions to problems of national importance. 

The Academy confers Fellowship on Indian and foreign nationals who have demonstrated eminence in their own chosen area and achieved outstanding accomplishments in engineering and technology. Professor Fan's research fields are particle technology and chemical reaction engineering. He is one of the world's leading authorities on fluidization and multiphase flow, powder technology, and energy and environmental reaction engineering. He is an inventor of the leading clean-coal technology in the United States and in total, has invented eight clean fossil energy conversion processes for CO2, SO2 and NOx emission control and electricity, syngas, hydrogen, chemicals or liquid fuels production. He is also an inventor of the electrical capacitance volume tomography commercialized by a spinoff company for three-dimensional multiphase flow and structural materials imaging.

Professor Fan's Fellowship becomes effective on November 1, 2019.

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